Open AccessUltra-shallow junction measurements: A review of SIMS approaches for annealed and processed wafers
Author(s) -
Gary Mount,
Stephen P. Smith,
C. J. Hitzman,
Victor K. F. Chia,
C. W. Magee
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56862
Subject(s) - dopant , wafer , materials science , annealing (glass) , ion implantation , characterization (materials science) , optoelectronics , silicon , secondary ion mass spectrometry , doping , engineering physics , electronic engineering , nanotechnology , ion , engineering , metallurgy , chemistry , organic chemistry
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