Open AccessModeling of manufacturing sensitivity and of statistically based process control requirements for a 0.18 μm NMOS device
Author(s) -
P. Zeitzoff,
A.F. Tasch,
Wendy E. Moore,
Sarah Khan,
D.A. St. Angelo
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56859
Subject(s) - process variation , nmos logic , statistical process control , sensitivity (control systems) , monte carlo method , statistical model , process (computing) , reduction (mathematics) , mosfet , computer science , variation (astronomy) , materials science , electronic engineering , engineering , transistor , mathematics , statistics , voltage , electrical engineering , physics , artificial intelligence , geometry , astrophysics , operating system
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