Open AccessNovel metrology for the DUV photolithography sequence
Author(s) -
Nickhil H. Jakatdar,
Xinhui Niu,
Haolin Zhang,
Junwei Lucas Bao,
Costas J. Spanos
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56842
Subject(s) - photolithography , metrology , materials science , sequence (biology) , computer science , optoelectronics , optics , physics , chemistry , biochemistry
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