Open AccessMetrology applications in lithography with variable angle spectroscopic ellipsometry
Author(s) -
James N. Hilfiker,
Ron Carpio,
R. A. Synowicki,
John A. Woollam
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56841
Subject(s) - ellipsometry , photomask , materials science , lithography , metrology , optics , characterization (materials science) , photolithography , optoelectronics , thin film , extreme ultraviolet lithography , x ray lithography , electron beam lithography , resist , nanotechnology , physics , layer (electronics)
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom