Open AccessOverlay metrology: the systematic, the random and the ugly
Author(s) -
Neal T. Sullivan,
Jennifer H. Shin
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56838
Subject(s) - overlay , metrology , stepper , chemical mechanical planarization , computer science , process (computing) , lithography , feature (linguistics) , wafer , reliability engineering , semiconductor device fabrication , electronic engineering , polishing , engineering , materials science , nanotechnology , optics , optoelectronics , mechanical engineering , linguistics , philosophy , physics , programming language , operating system
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