Open AccessAn overview of CD metrology for advanced CMOS process development
Author(s) -
Herschel M. Marchman
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56837
Subject(s) - metrology , throughput , automation , dimensional metrology , lens (geology) , computer science , repeatability , sample (material) , image resolution , image sensor , feature (linguistics) , resolution (logic) , optics , materials science , engineering , artificial intelligence , physics , mechanical engineering , telecommunications , linguistics , chemistry , philosophy , chromatography , wireless , thermodynamics
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