Open AccessMeasurement of silicon doping profiles using infrared ellipsometry combined with anodic oxidation sectioning
Author(s) -
Thomas E. Tiwald,
Aaron David Miller,
John A. Woollam
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56798
Subject(s) - ellipsometry , materials science , ohmic contact , infrared , electrical resistivity and conductivity , analytical chemistry (journal) , silicon , drude model , infrared spectroscopy , doping , oxide , hydrofluoric acid , substrate (aquarium) , anode , optoelectronics , optics , chemistry , thin film , electrode , nanotechnology , metallurgy , physics , electrical engineering , engineering , organic chemistry , layer (electronics) , chromatography , oceanography , geology
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