Open AccessMetrology aspects of SIMS depth profiling for advanced ULSI processes
Author(s) -
A. Budrevich,
Jerry Hunter
Publication year - 1998
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1063/1.56792
Subject(s) - metrology , materials science , profiling (computer programming) , secondary ion mass spectrometry , dopant , semiconductor device fabrication , doping , transistor , ion implantation , optoelectronics , semiconductor industry , computer science , nanotechnology , ion , electrical engineering , engineering , wafer , chemistry , optics , voltage , manufacturing engineering , physics , organic chemistry , operating system
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