Open AccessResonance ionization of sputtered atoms: Quantitative analysis in the near-surface region of silicon wafers
Author(s) -
W. F. Calaway,
Daniel R. Spiegel,
Archibald Marshall,
S. W. Downey,
M. J. Pellin
Publication year - 1997
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.52609
Subject(s) - wafer , silicon , monolayer , analytical chemistry (journal) , materials science , ionization , photoresist , mass spectrometry , resonance (particle physics) , impurity , optoelectronics , chemistry , atomic physics , ion , layer (electronics) , nanotechnology , physics , organic chemistry , chromatography
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