Open AccessElectrical description of an inductively coupled plasma processing reactor with discharge parameters calculated from a global model
Author(s) -
Minglu Cao,
Yijia Lu,
Jia Cheng,
Linhong Ji
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5145296
Subject(s) - electromagnetic coil , transformer , inductively coupled plasma , plasma , capacitance , voltage , materials science , inductive coupling , capacitive coupling , electrical engineering , capacitive sensing , nuclear engineering , engineering , chemistry , physics , electrode , quantum mechanics
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