Open AccessOn-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
Author(s) -
Tadayoshi Sakai,
Maki Kushimoto,
Ziyi Zhang,
Naoharu Sugiyama,
L. J. Schowalter,
Yoshio Honda,
Chiaki Sasaoka,
Hiroshi Amano
Publication year - 2020
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5145017
Subject(s) - materials science , fabrication , wafer , optoelectronics , etching (microfabrication) , diode , laser , lasing threshold , distributed bragg reflector , dry etching , layer (electronics) , distributed bragg reflector laser , optics , semiconductor laser theory , nanotechnology , wavelength , medicine , alternative medicine , physics , pathology
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