Open AccessSelective etching in graphene–MoS2 heterostructures for fabricating graphene-contacted MoS2 transistors
Author(s) -
Zeliang Sun,
Gang Peng,
Zongqi Bai,
Xiangzhe Zhang,
Yuehua Wei,
Chuyun Deng,
Yi Zhang,
Mengjian Zhu,
Shiqiao Qin,
Zheng Li,
Wei Luo
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5141143
Subject(s) - graphene , materials science , etching (microfabrication) , heterojunction , molybdenum disulfide , optoelectronics , transistor , contact resistance , nanotechnology , electrode , layer (electronics) , graphene nanoribbons , graphene oxide paper , composite material , electrical engineering , chemistry , engineering , voltage
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