Solubility limit and material properties of a κ-(AlxGa1−x)2O3 thin film with a lateral cation gradient on (00.1)Al2O3 by tin-assisted PLD | Zendy

Anna Hassa | Zendy; Chris Sturm | Zendy; Max Kneiß | Zendy; Daniel Splith | Zendy; Holger von Wenckstern | Zendy; Thorsten Schultz | Zendy; Norbert Koch | Zendy; Michael Lorenz | Zendy; Marius Grundmann | Zendy

Open Access

Solubility limit and material properties of a κ-(AlxGa1−x)2O3 thin film with a lateral cation gradient on (00.1)Al2O3 by tin-assisted PLD

Author(s) -

Anna Hassa,

Chris Sturm,

Max Kneiß,

Daniel Splith,

Holger von Wenckstern,

Thorsten Schultz,

Norbert Koch,

Michael Lorenz,

Marius Grundmann

Publication year - 2020

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/1.5141041

Subject(s) - materials science , orthorhombic crystal system , lattice constant , band gap , thin film , ellipsometry , refractive index , tin , analytical chemistry (journal) , dielectric , pulsed laser deposition , ternary operation , sapphire , optics , crystallography , diffraction , crystal structure , laser , nanotechnology , optoelectronics , chemistry , physics , programming language , chromatography , computer science , metallurgy

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