Phase transformation in MOCVD growth of (AlxGa1−x)2O3 thin films | Zendy

A F M Anhar Uddin Bhuiyan | Zendy; Zixuan Feng | Zendy; Jared M. Johnson | Zendy; HsienLien Huang | Zendy; Jith Sarker | Zendy; Menglin Zhu | Zendy; Md Rezaul Karim | Zendy; Baishakhi Mazumder | Zendy; Jinwoo Hwang | Zendy; Hongping Zhao | Zendy

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Phase transformation in MOCVD growth of (AlxGa1−x)2O3 thin films

Author(s) -

A F M Anhar Uddin Bhuiyan,

Zixuan Feng,

Jared M. Johnson,

HsienLien Huang,

Jith Sarker,

Menglin Zhu,

Md Rezaul Karim,

Baishakhi Mazumder,

Jinwoo Hwang,

Hongping Zhao

Publication year - 2020

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/1.5140345

Subject(s) - metalorganic vapour phase epitaxy , materials science , chemical vapor deposition , thin film , analytical chemistry (journal) , homogeneity (statistics) , chemical composition , diffraction , atom probe , transmission electron microscopy , phase (matter) , scanning electron microscope , crystallography , epitaxy , chemistry , optics , nanotechnology , composite material , statistics , mathematics , organic chemistry , physics , layer (electronics) , chromatography

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