Open AccessFormation of thermal donor enhanced by oxygen precipitation in silicon crystal
Author(s) -
Kazuhisa Torigoe,
Toshiaki Ono
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5140206
Subject(s) - silicon , oxygen , materials science , oxide , annealing (glass) , stacking , precipitation , crystal (programming language) , thermal , crystallography , crystal growth , crystallographic defect , thermal oxidation , chemistry , metallurgy , thermodynamics , physics , organic chemistry , meteorology , computer science , programming language
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