Accessing ratios of quantized resistances in graphene p–n junction devices using multiple terminals
Author(s) -
Dinesh K. Patel,
Martina Marzano,
ChiehI Liu,
Heather M. Hill,
Mattias Kruskopf,
Hanbyul Jin,
Jiuning Hu,
David B. Newell,
ChiTe Liang,
Randolph E. Elmquist,
Albert F. Rigosi
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5138901
Subject(s) - graphene , lithography , optoelectronics , ultraviolet , millimeter , computer science , physics , materials science , nanotechnology , electronic engineering , engineering , optics
The utilization of multiple current terminals on millimeter-scale graphene p–n junction devices has enabled the measurement of many atypical, fractional multiples of the quantized Hall resistance at the ν = 2 plateau (RH ≈ 12 906 Ω). These fractions take the form abRH and can be determined both analytically and by simulations. These experiments validate the use of either the LTspice circuit simulator or the analytical framework recently presented in similar work. Furthermore, the production of several devices with large-scale junctions substantiates the approach of using simple ultraviolet lithography to obtain junctions of sufficient sharpness.The utilization of multiple current terminals on millimeter-scale graphene p–n junction devices has enabled the measurement of many atypical, fractional multiples of the quantized Hall resistance at the ν = 2 plateau (RH ≈ 12 906 Ω). These fractions take the form abRH and can be determined both analytically and by simulations. These experiments validate the use of either the LTspice circuit simulator or the analytical framework recently presented in similar work. Furthermore, the production of several devices with large-scale junctions substantiates the approach of using simple ultraviolet lithography to obtain junctions of sufficient sharpness.
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