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Improving photoresponsivity in GaAs film grown on Al-induced-crystallized Ge on an insulator
Author(s) -
Takeshi Nishida,
Takashi Suemasu,
Kaoru Toko
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5138677
Subject(s) - materials science , crystallinity , raman spectroscopy , epitaxy , crystallite , layer (electronics) , quantum efficiency , optoelectronics , stoichiometry , diffraction , analytical chemistry (journal) , chemistry , optics , nanotechnology , metallurgy , composite material , physics , organic chemistry , chromatography

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