Open AccessN doped ZnO (N:ZnO) film prepared by reactive HiPIMS deposition technique
Author(s) -
Zhengduo Wang,
Qian Li,
Yan Yuan,
Lizhen Yang,
Haibao Zhang,
Zhongwei Liu,
Jiting Ouyang,
Qiang Chen
Publication year - 2020
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5132620
Subject(s) - high power impulse magnetron sputtering , materials science , analytical chemistry (journal) , dopant , doping , sputter deposition , inductively coupled plasma , sputtering , conductivity , thin film , plasma , nanotechnology , optoelectronics , chemistry , physics , chromatography , quantum mechanics
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