Open AccessInvestigation on the structural property of the sputtered hcp-phase boron nitride tunnel barrier for spintronic applications
Author(s) -
Chaoyi Peng,
Shaoqian Yin,
Delin Zhang,
Xiaohui Chao,
Patrick Quarterman,
JianPing Wang
Publication year - 2020
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5130463
Subject(s) - spintronics , materials science , tunnel magnetoresistance , boron nitride , sputtering , annealing (glass) , ferromagnetism , barrier layer , tantalum nitride , condensed matter physics , thin film , layer (electronics) , composite material , nanotechnology , physics
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