Open AccessThe effect of kinetics on intrinsic stress generation and evolution in sputter-deposited films at conditions of high atomic mobility
Author(s) -
Andreas Jamnig,
N. Pliatsikas,
K. Sarakinos,
G. Abadias
Publication year - 2020
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5130148
Subject(s) - materials science , stress relaxation , sputtering , stress (linguistics) , sputter deposition , compressive strength , coalescence (physics) , ultimate tensile strength , kinetics , thin film , composite material , metallurgy , nanotechnology , creep , physics , linguistics , philosophy , quantum mechanics , astrobiology
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