Open AccessOptimization of parameters for generating nitrogen plasma in plasma-assisted MOCVD growth of InGaN thin films
Author(s) -
Pepen Arifin,
Heri Sutanto,
Agus Subagio,
Sugianto Sugianto,
M A Mustajab
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5126943
Subject(s) - metalorganic vapour phase epitaxy , thin film , chemical vapor deposition , nitrogen , materials science , analytical chemistry (journal) , plasma , volumetric flow rate , sapphire , indium , epitaxy , laser , chemistry , optoelectronics , nanotechnology , layer (electronics) , optics , physics , organic chemistry , chromatography , quantum mechanics
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