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Influence of rf sputter power on ZnO film characteristics for transparent memristor devices
Author(s) -
Firman Mangasa Simanjuntak,
Takeo Ohno,
Seiji Samukawa
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5125665
Subject(s) - memristor , materials science , radio frequency , sputtering , rf power amplifier , optoelectronics , power (physics) , wide bandgap semiconductor , sputter deposition , switching time , thin film , electrical engineering , nanotechnology , cmos , engineering , physics , amplifier , quantum mechanics

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