Resistive switching in a LaMnO3 + δ/TiN memory cell investigated by operando hard X-ray photoelectron spectroscopy
Author(s) -
Benjamin Meunier,
E. Martínez,
Raquel Rodríguez-Lamas,
Dolors Pla,
Mónica Burriel,
Michel Boudard,
Carmen Jiménez,
JeanPascal Rueff,
O. Renault
Publication year - 2019
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5125420
Subject(s) - tin , x ray photoelectron spectroscopy , resistive random access memory , materials science , valence (chemistry) , oxygen , electrode , resistive touchscreen , photoemission spectroscopy , auger electron spectroscopy , analytical chemistry (journal) , chemical physics , chemistry , chemical engineering , metallurgy , electrical engineering , organic chemistry , chromatography , nuclear physics , engineering , physics
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