Open AccessEffects of damages induced by indium-tin-oxide reactive plasma deposition on minority carrier lifetime in silicon crystal
Author(s) -
Takefumi Kamioka,
Yuki Isogai,
Yutaka Hayashi,
Yoshio Ohshita,
Atsushi Ogura
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5124903
Subject(s) - indium tin oxide , band bending , analytical chemistry (journal) , materials science , annealing (glass) , silicon , oxide , indium , optoelectronics , chemistry , thin film , nanotechnology , composite material , chromatography , metallurgy
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