Hydrogen diffusion from PECVD silicon nitride into multicrystalline silicon wafers: Elastic recoil detection analysis (ERDA) measurements and impact on light and elevated temperature induced degradation (LeTID) | Zendy

Romika Sharma | Zendy; Saumitra Vajandar | Zendy; T. Osipowicz | Zendy; Joel B. Li | Zendy; Armin G. Aberle | Zendy; Ying Huang | Zendy

Open Access

Hydrogen diffusion from PECVD silicon nitride into multicrystalline silicon wafers: Elastic recoil detection analysis (ERDA) measurements and impact on light and elevated temperature induced degradation (LeTID)

Author(s) -

Romika Sharma,

Saumitra Vajandar,

T. Osipowicz,

Joel B. Li,

Armin G. Aberle,

Ying Huang

Publication year - 2019

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.5123896

Subject(s) - elastic recoil detection , silicon , materials science , passivation , hydrogen , silicon nitride , wafer , grain boundary , carrier lifetime , crystalline silicon , plasma enhanced chemical vapor deposition , solar cell , nuclear reaction analysis , impurity , analytical chemistry (journal) , optoelectronics , nanotechnology , thin film , metallurgy , chemistry , microstructure , layer (electronics) , organic chemistry , chromatography

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