Characterization of atomic layer deposited alumina thin films on black silicon textures using helium ion microscopy
Author(s) -
Tudor E. Scheul,
Edris Khorani,
Tasmiat Rahman,
Stuart A. Boden
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5123858
Subject(s) - passivation , materials science , nanostructure , black silicon , conformal coating , silicon , atomic layer deposition , layer (electronics) , optoelectronics , ion beam , focused ion beam , nanotechnology , coating , ion , chemistry , organic chemistry
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom