Open AccessNumerical simulation of an ozone-based wet-chemical etching
Author(s) -
Lena Mohr,
Tobias Krick,
Martin Zimmer,
Andreas Fischer,
Anamaria Moldovan
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5123856
Subject(s) - multiphysics , isotropic etching , rounding , materials science , parametric statistics , wafer , common emitter , etching (microfabrication) , mechanics , composite material , finite element method , optoelectronics , structural engineering , computer science , engineering , physics , statistics , mathematics , layer (electronics) , operating system
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