Open AccessFine line Al printing on narrow point contact opening for front side metallization
Author(s) -
K. Tsuji,
Shota Suzuki,
N. Morishita,
Takashi Kuroki,
Masahiro Nakahara,
M. Dhamrin,
Zih-Wei Peng,
Thomas Bück,
Noritaka Usami
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5123846
Subject(s) - materials science , common emitter , saturation current , optoelectronics , silicon , quantum dot , aluminium , doping , composite material , electrical engineering , voltage , engineering
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