Investigation of contact resistivity on a laser doped boron emitter from CVD doping layers
Author(s) -
Matthias Bernd Mörtter,
Josh Engelhardt,
Giso Hahn,
Barbara Terheiden
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5123840
Subject(s) - materials science , wafer , scanning electron microscope , electrical resistivity and conductivity , doping , crystallite , boron , contact angle , silicon , common emitter , analytical chemistry (journal) , chemical engineering , composite material , nanotechnology , optoelectronics , metallurgy , chemistry , organic chemistry , chromatography , electrical engineering , engineering
In this study, the contact formation to a p+-doped emitter created by laser irradiation is investigated. We examine the influence of different firing temperatures and paste compositions on the contact formation on Si substrates after laser treatment of the Si surface. Commercially available AgAl and Ag pastes are screen-printed on the Si wafers. The formed contacts show low contact resistivity ≤2 mΩcm2 for both pastes within the investigated firing temperature ranges. Furthermore, top view investigations of the formed contacts by electron scanning microscopy revealed: for the AgAl containing paste typical AgAl spikes grow into the Si surface; for the Al-free Ag paste small Ag crystallites grow. In addition, a new structure is observed on the contact surface. Using energy dispersive X-ray spectroscopy, Ag as an incorporated part of this structure has been identified. This structure can be considered as an AgSi alloy, covering most of the contact surface. This potentially explains the low contact resistivity values in case of the Ag paste.
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