Open AccessSputtering of silicon thin films for passivated contacts
Author(s) -
Jan Hoß,
Jens Baumann,
Markus Berendt,
Uwe Graupner,
René Köhler,
Jan Lossen,
Martin Thumsch,
E. Schneiderlöchner
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5123834
Subject(s) - passivation , materials science , sputtering , doping , wafer , silicon , crystallization , plasma enhanced chemical vapor deposition , optoelectronics , sputter deposition , annealing (glass) , layer (electronics) , deposition (geology) , thin film , nanotechnology , composite material , chemical engineering , paleontology , sediment , engineering , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom