Open AccessTCO contacts on poly-Si layers: High and low temperature approaches to maintain passivation and contact properties
Author(s) -
Elise Bruhat,
Thibaut Desrues,
Danièle Blanc-Pélissier,
Benoît Martel,
Raphaël Cabal,
Sébastien Dubois
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5123828
Subject(s) - passivation , materials science , annealing (glass) , optoelectronics , indium tin oxide , silicon , contact resistance , sheet resistance , electrical resistivity and conductivity , transparent conducting film , tin , electrical conductor , thin film , layer (electronics) , nanotechnology , composite material , metallurgy , electrical engineering , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom