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Transmorphic epitaxial growth of AlN nucleation layers on SiC substrates for high-breakdown thin GaN transistors
Author(s) -
Jun Lu,
JrTai Chen,
Martin Dahlqvist,
Riad Kabouche,
Farid Medjdoub,
Johanna Rosén,
Olof Kordina,
Lars Hultman
Publication year - 2019
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5123374
Subject(s) - materials science , epitaxy , nucleation , heterojunction , chemical vapor deposition , optoelectronics , grain boundary , wide bandgap semiconductor , semiconductor , condensed matter physics , thin film , crystallography , nanotechnology , layer (electronics) , chemistry , composite material , microstructure , physics , organic chemistry
Interfaces containing misfit dislocations deteriorate electronic properties of heteroepitaxial wide bandgap III-nitride semiconductors grown on foreign substrates, as a result of lattice and therma...

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