z-logo
open-access-imgOpen Access
On the origin of dislocation generation and annihilation in α -Ga2O3 epilayers on sapphire
Author(s) -
T. C.,
Xuanhu Chen,
Yue Kuang,
Li Li,
J. Li,
Felipe Kremer,
Fangfang Ren,
Shulin Gu,
R. Zhang,
Yi Zheng,
Hark Hoe Tan,
C. Jagadish,
Jiandong Ye
Publication year - 2019
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5120554
Subject(s) - sapphire , dislocation , materials science , annihilation , epitaxy , condensed matter physics , coalescence (physics) , crystallography , transmission electron microscopy , diffraction , optoelectronics , optics , layer (electronics) , composite material , physics , nanotechnology , chemistry , laser , quantum mechanics , astrobiology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom