Open AccessSensitivity enhancement of poly(methyl methacrylate) upon exposure to picosecond-pulsed extreme ultraviolet
Author(s) -
Yuji Hosaka,
G. Isoyama,
Hiroki Yamamoto,
Masahiko Ishino,
Thanh-Hung Dinh,
Masaharu Nishikino,
Yasunari Maekawa
Publication year - 2019
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5116284
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , picosecond , resist , materials science , optics , lithography , optoelectronics , irradiation , nanosecond , laser , physics , nanotechnology , layer (electronics) , nuclear physics
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