Open AccessHigh-pressure microwave plasma oxidation of 4H-SiC with low interface trap density
Author(s) -
Xinyu Liu,
Jilong Hao,
Nannan You,
Yun Bai,
Shengkai Wang
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5115538
Subject(s) - plasma , thermal oxidation , microwave , materials science , oxide , analytical chemistry (journal) , thermal , chemistry , thermodynamics , metallurgy , physics , chromatography , quantum mechanics
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