Open AccessAlmost pinning-free bismuth/Ge and /Si interfaces
Author(s) -
Tomonori Nishimura,
Xuan Luo,
Soshi Matsumoto,
Takeaki Yajima,
Akira Toriumi
Publication year - 2019
Publication title -
aip advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5115535
Subject(s) - bismuth , germanide , germanium , materials science , fermi level , silicide , silicon , condensed matter physics , metal , electron , crystallography , optoelectronics , chemistry , metallurgy , physics , quantum mechanics
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