Open AccessNanoscale tensile strain in perfect silicon crystals studied by high-resolution X-ray diffraction
Author(s) -
C. Cusatis
Publication year - 2019
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.5115480
Subject(s) - materials science , diffractometer , silicon , diffraction , lattice constant , x ray crystallography , optics , x ray , bragg's law , crystal (programming language) , ultimate tensile strength , monocrystalline silicon , crystallography , composite material , optoelectronics , physics , scanning electron microscope , chemistry , computer science , programming language
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