Open AccessDramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers
Author(s) -
Jordan Bouaziz,
Pédro Rojo Romeo,
Nicolas Baboux,
Raluca Negrea,
L. Pintilie,
Bertrand Vilquin
Publication year - 2019
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5110894
Subject(s) - materials science , ferroelectricity , orthorhombic crystal system , annealing (glass) , analytical chemistry (journal) , transmission electron microscopy , crystallization , sputter deposition , thin film , sputtering , optoelectronics , dielectric , crystallography , metallurgy , nanotechnology , crystal structure , chemistry , chromatography , organic chemistry
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