Open AccessResidual solvent additive enables the nanostructuring of PTB7-Th:PC71BM solar cells via soft lithography
Author(s) -
Chao Wang,
Eliot Gann,
Anthony S. R. Chesman,
Christopher R. McNeill
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5109140
Subject(s) - materials science , lithography , soft lithography , microstructure , nanotechnology , polymer , layer (electronics) , chemical engineering , composite material , optoelectronics , fabrication , medicine , alternative medicine , pathology , engineering
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