Open AccessLow-energy ion polishing of Si in W/Si soft X-ray multilayer structures
Author(s) -
R. V. Medvedev,
K. V. Nikolaev,
Andrey Zameshin,
D. IJpes,
Igor A. Makhotkin,
S. N. Yakunin,
Andrey Yakshin,
F. Bijkerk
Publication year - 2019
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5097378
Subject(s) - materials science , polishing , grazing incidence small angle scattering , sputtering , sputter deposition , scattering , surface roughness , optics , specular reflection , surface finish , ion , x ray reflectivity , analytical chemistry (journal) , thin film , chemistry , nanotechnology , metallurgy , inelastic scattering , composite material , physics , organic chemistry , chromatography , x ray raman scattering
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