Open AccessRemotely induced high-density hollow-anode plasma and its application to fast deposition of photosensitive microcrystalline silicon thin film with preferential <110> orientation
Author(s) -
Toshihiro Tabuchi,
Yasumasa Toyoshima,
Shinichi Fujimoto,
Masayuki Takashiri
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5095550
Subject(s) - cathode , anode , materials science , plasma , thin film , silicon , analytical chemistry (journal) , hydrogen , microcrystalline , chemical vapor deposition , glow discharge , optoelectronics , electrode , chemistry , nanotechnology , crystallography , physics , organic chemistry , quantum mechanics , chromatography
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