Open AccessRapid wafer-scale fabrication with layer-by-layer thickness control of atomically thin MoS2 films using gas-phase chemical vapor deposition
Author(s) -
Nitin Babu Shinde,
Bellarmine Francis,
M. S. Ramachandra Rao,
Beo Deul Ryu,
S. Chandramohan,
Senthil Kumar Eswaran
Publication year - 2019
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.5095451
Subject(s) - materials science , chemical vapor deposition , wafer , thin film , monolayer , raman spectroscopy , optoelectronics , nanotechnology , layer (electronics) , fabrication , metalorganic vapour phase epitaxy , combustion chemical vapor deposition , layer by layer , chemical engineering , epitaxy , carbon film , optics , physics , alternative medicine , pathology , engineering , medicine
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