Open AccessSelf-organizing plasma behavior in RF magnetron sputtering discharges
Author(s) -
Matjaž Panjan
Publication year - 2019
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.5094240
Subject(s) - argon , plasma , cavity magnetron , atomic physics , sputter deposition , sputtering , electron , range (aeronautics) , discharge pressure , chemistry , materials science , physics , thin film , thermodynamics , nanotechnology , composite material , nuclear physics , gas compressor
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