Low-frequency noise and defects in copper and ruthenium resistors | Zendy

Daniel M. Fleetwood | Zendy; Sofie Beyne | Zendy; Rong Jiang | Zendy; Simeng E. Zhao | Zendy; Pan Wang | Zendy; Stefano Bonaldo | Zendy; Michael W. McCurdy | Zendy; Zs. Tőkei | Zendy; Ingrid De Wolf | Zendy; Kristof Croes | Zendy; En Xia Zhang | Zendy; Michael L. Alles | Zendy; Ronald D. Schrimpf | Zendy; Robert A. Reed | Zendy; D. Linten | Zendy

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Low-frequency noise and defects in copper and ruthenium resistors

Author(s) -

Daniel M. Fleetwood,

Sofie Beyne,

Rong Jiang,

Simeng E. Zhao,

Pan Wang,

Stefano Bonaldo,

Michael W. McCurdy,

Zs. Tőkei,

Ingrid De Wolf,

Kristof Croes,

En Xia Zhang,

Michael L. Alles,

Ronald D. Schrimpf,

Robert A. Reed,

D. Linten

Publication year - 2019

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.5093549

Subject(s) - resistor , electromigration , copper , materials science , ruthenium , microelectronics , noise (video) , fluence , optoelectronics , irradiation , analytical chemistry (journal) , metallurgy , composite material , chemistry , electrical engineering , physics , nuclear physics , chromatography , biochemistry , voltage , artificial intelligence , computer science , engineering , catalysis , image (mathematics)

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