Open AccessNonlinear two-layer model for photocarrier radiometry of ion-implanted silicon wafers
Author(s) -
Xiaoke Lei,
Bincheng Li,
Qiming Sun,
Jing Wang,
Chunming Gao
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5092621
Subject(s) - wafer , ion implantation , materials science , excitation , radiometry , nonlinear system , semiconductor , monte carlo method , optoelectronics , optics , ion , chemistry , physics , quantum mechanics , organic chemistry , statistics , mathematics
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