Open AccessSurface structure chemical transfer method to fabricate low reflectance multi-crystalline Si wafers produced with fixed abrasive machining technology
Author(s) -
Shogo Kunieda,
Kentaro Imamura,
Hikaru Kobayashi
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5091717
Subject(s) - materials science , wafer , passivation , abrasive , layer (electronics) , etching (microfabrication) , silicon , silicon nitride , optoelectronics , isotropic etching , surface roughness , nanocrystalline material , machining , surface finish , crystalline silicon , composite material , metallurgy , nanotechnology
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