Open AccessEnhanced permeability dielectric FeCo/Al2O3 multilayer thin films with tailored properties deposited by magnetron sputtering on silicon
Author(s) -
C.V. Falub,
Srinivas V. Pietambaram,
O. Yıldırım,
Mojmír Meduňa,
Ondřej Caha,
R. Hida,
Xue Zhao,
Jan Ambrosini,
H. Rohrmann,
Hans J. Hug
Publication year - 2019
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.5079477
Subject(s) - materials science , sputter deposition , sputtering , microstructure , dielectric , thin film , silicon , crystallite , wafer , composite material , analytical chemistry (journal) , optoelectronics , metallurgy , nanotechnology , chemistry , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom