Open AccessLow temperature preparation of HfO2/SiO2stack structure for interface dipole modulation
Author(s) -
Noriyuki Miyata
Publication year - 2018
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.5057398
Subject(s) - annealing (glass) , materials science , oxide , monolayer , dipole , stack (abstract data type) , analytical chemistry (journal) , chemistry , nanotechnology , composite material , metallurgy , programming language , organic chemistry , computer science , chromatography
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