Ion-beam lithography: A promising technique for the patterning of graphene oxide foil | Zendy

M. Cutroneo | Zendy; V. Havránek | Zendy; Anna Macková | Zendy; P. Malínský | Zendy; L. Torrisi | Zendy; J. A. Pérez-Hernández | Zendy; L. Roso | Zendy; Jan Luxa | Zendy; Zdeněk Sofer | Zendy; Roman Böttger | Zendy

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Ion-beam lithography: A promising technique for the patterning of graphene oxide foil

Author(s) -

M. Cutroneo,

V. Havránek,

Anna Macková,

P. Malínský,

L. Torrisi,

J. A. Pérez-Hernández,

L. Roso,

Jan Luxa,

Zdeněk Sofer,

Roman Böttger

Publication year - 2018

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.5053388

Subject(s) - graphene , materials science , foil method , oxide , electron beam lithography , focused ion beam , lithography , rutherford backscattering spectrometry , optoelectronics , graphene oxide paper , graphene nanoribbons , ion beam lithography , ion beam , stencil lithography , fabrication , nanotechnology , ion , resist , thin film , chemistry , composite material , medicine , alternative medicine , organic chemistry , layer (electronics) , pathology , metallurgy

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