Plasma impedance prediction model and impedance matching by frequency tuning in radio frequency negative ion sources
Author(s) -
W. Kobayashi,
K. Nishida,
S. Mattei,
J. Lettry,
A. Hatayama
Publication year - 2018
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5053317
Subject(s) - radio frequency , electrical impedance , impedance matching , rf power amplifier , plasma , maximum power transfer theorem , inductively coupled plasma , radio frequency power transmission , materials science , power (physics) , physics , computer science , optoelectronics , electrical engineering , engineering , telecommunications , amplifier , cmos , quantum mechanics
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